8" Wafer Fabrication Facility


180 nanometer CMOS Process for Fabrication of products in Digital, Mixed Signal and Analog domains


Process Equipment Line, In-line Inspection & Metrology Tools and Support Utilities as per international standards


Clean Rooms of Class 1, 10, 100 and 1000 with controlled environmental conditions


Dedicated bays for Wafer Fabrication Processes viz. Diffusion, Lithography, Etching (Dry & Wet), Implantation, Thin Films working seamlessly from Wafer-in to Wafer-out


BKMs (Best Known Methods) comprising regular Tool QCs, Preventive Maintenance and Process Control & Monitoring through in-line defect inspection & measurement through Metrology Tools as per industry standards


Commensurate with the requirements of Fab Line, support infrastructure namely High Purity Systems, Utility Plants and Distribution Network operate on 24x7 basis

   
 


Implant Area



Thin Film Area