8" Wafer Fabrication Facility

180 nanometer CMOS Process for Fabrication of products in Digital, Mixed Signal and Analog domains

Process Equipment Line, In-line Inspection & Metrology Tools and Support Utilities as per international standards

Clean Rooms of Class 1, 10, 100 and 1000 with controlled environmental conditions

Dedicated bays for Wafer Fabrication Processes viz. Diffusion, Lithography, Etching (Dry & Wet), Implantation, Thin Films working seamlessly from Wafer-in to Wafer-out

BKMs (Best Known Methods) comprising regular Tool QCs, Preventive Maintenance and Process Control & Monitoring through in-line defect inspection & measurement through Metrology Tools as per industry standards

Commensurate with the requirements of Fab Line, support infrastructure namely High Purity Systems, Utility Plants and Distribution Network operate on 24x7 basis


Implant Area

Thin Film Area